Process for preparing a high-density and middle-porosity catalys

Catalyst – solid sorbent – or support therefor: product or process – Regenerating or rehabilitating catalyst or sorbent – Treating with a liquid or treating in a liquid phase,...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423535, 502 21, 502 25, 502 34, 502243, 502247, 502527, B01J 2392, B01J 2120, B01J 2322, C01B 1774

Patent

active

049835572

ABSTRACT:
A process for preparing a high-density and, low-silica catalyst, supported on a siliceous matrix, based on vanadium, oxygen and alkali metals, wherein the V.sub.2 O.sub.5 content ranges from 6 to 9% by weight, the K.sub.2 O content ranges from 8.5 to 12% by weight and the particle density ranges from 0.90 to 1.40 g/cm.sup.3 and wherein furthermore:

REFERENCES:
patent: 1880678 (1932-10-01), Beardsley et al.
patent: 2029376 (1936-02-01), Joseph
patent: 3186794 (1965-06-01), Davies
patent: 4155875 (1979-05-01), Yamaguchi et al.
patent: 4284530 (1981-08-01), Sherif
patent: 4410450 (1983-10-01), Sasaki et al.
patent: 4485190 (1984-11-01), Sherif
Ind. Eng. Chem. Prod. Dev., 1981, 20, 439-450, Neimark et al., "Theory of Preparation of Supported Catalysts".
Journal of Catalysis, vol. 43, 1976, pp. 243-251; Academic Press, Inc. Duluth, MN; S. A. Hassan, et al. "Catalytic and Surface Characteristics of Newly Imported, Exhausted, and Regenerated V205 Catalysts Used in H2S04 Manufacturing".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for preparing a high-density and middle-porosity catalys does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing a high-density and middle-porosity catalys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing a high-density and middle-porosity catalys will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-934600

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.