Catalyst – solid sorbent – or support therefor: product or process – Regenerating or rehabilitating catalyst or sorbent – Treating with a liquid or treating in a liquid phase,...
Patent
1989-01-17
1991-01-08
Konopka, Paul E.
Catalyst, solid sorbent, or support therefor: product or process
Regenerating or rehabilitating catalyst or sorbent
Treating with a liquid or treating in a liquid phase,...
423535, 502 21, 502 25, 502 34, 502243, 502247, 502527, B01J 2392, B01J 2120, B01J 2322, C01B 1774
Patent
active
049835572
ABSTRACT:
A process for preparing a high-density and, low-silica catalyst, supported on a siliceous matrix, based on vanadium, oxygen and alkali metals, wherein the V.sub.2 O.sub.5 content ranges from 6 to 9% by weight, the K.sub.2 O content ranges from 8.5 to 12% by weight and the particle density ranges from 0.90 to 1.40 g/cm.sup.3 and wherein furthermore:
REFERENCES:
patent: 1880678 (1932-10-01), Beardsley et al.
patent: 2029376 (1936-02-01), Joseph
patent: 3186794 (1965-06-01), Davies
patent: 4155875 (1979-05-01), Yamaguchi et al.
patent: 4284530 (1981-08-01), Sherif
patent: 4410450 (1983-10-01), Sasaki et al.
patent: 4485190 (1984-11-01), Sherif
Ind. Eng. Chem. Prod. Dev., 1981, 20, 439-450, Neimark et al., "Theory of Preparation of Supported Catalysts".
Journal of Catalysis, vol. 43, 1976, pp. 243-251; Academic Press, Inc. Duluth, MN; S. A. Hassan, et al. "Catalytic and Surface Characteristics of Newly Imported, Exhausted, and Regenerated V205 Catalysts Used in H2S04 Manufacturing".
Cavalli Luigi
Nardini Renzo
Ausimont S.r.l.
Konopka Paul E.
LandOfFree
Process for preparing a high-density and middle-porosity catalys does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing a high-density and middle-porosity catalys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing a high-density and middle-porosity catalys will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-934600