Radiation imagery chemistry: process – composition – or product th – Thermographic process – Heat applied after imaging
Patent
1978-07-25
1980-03-18
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Thermographic process
Heat applied after imaging
430 30, 430338, 430567, 430569, 430620, G03C 102, G03C 172
Patent
active
041938046
ABSTRACT:
A process for preparing a composition for use in a thermally developable light-sensitive material which comprises reacting (a) an organic silver salt with (b) a halogen atom-releasing compound to form a mixture of the organic silver salt and a silver halide wherein the reaction of components (a) and (b) is carried out while controlling the oxidation-reduction potential of the reaction solution. Silver halide grains of a uniform grain size and a narrow grain size distribution can be obtained, and, after (c) a reducing agent is added to the composition, the resulting composition can be used to produce a thermally developable light-sensitive material having superior sensitivity and contrast.
REFERENCES:
patent: 3043570 (1962-07-01), Seiter
patent: 3457075 (1969-07-01), Morgan et al.
patent: 3598593 (1971-08-01), Klinger
patent: 3650757 (1971-03-01), Irie et al.
patent: 3773516 (1973-11-01), Gutoff
patent: 3782954 (1974-01-01), Porter et al.
patent: 3817756 (1974-06-01), Claes et al.
patent: 3821002 (1974-06-01), Culhane et al.
patent: 3885970 (1975-05-01), Miyahara
patent: 4030931 (1977-06-01), Noguchi et al.
Ikenoue Shinpei
Masuda Takao
Fuji Photo Film Co. , Ltd.
Kimlin Edward C.
LandOfFree
Process for preparing a composition for a thermally developable does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing a composition for a thermally developable , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing a composition for a thermally developable will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1122797