Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1982-04-04
1984-08-14
Carter, Herbert T.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423335, 423263, 423592, 423593, 423600, 423618, 423625, 423630, 501 53, 65 33, 423608, 423610, C01B 3318, C01G 1702
Patent
active
044656564
ABSTRACT:
The specification discloses new and improved processes for forming water-free metal or non-metal oxide materials, which may then be melted and formed into optical components in vitreous or crystal form, which are free of the hydrogen-impurity absorption in the near infrared wavelength range. In one process, a water-free oxide is prepared by reacting a chosen nonpolar compound containing the desired metal or non-metal with an aprotic oxygen-containing compound to form the oxide as a precipitate in a chosen aprotic nonaqueous liquid solvent which provides a water-free environment during the formation of the oxide, to prevent the inclusion of water and water-derived impurities in the oxide as formed. Then the oxide-containing precipitate is subjected to a reactive atmosphere process by exposing the powder to a chosen gas phase reactive atmosphere comprising atomic halogen at a predetermined elevated temperature for a predetermined period of time, to remove traces of water and water-derived impurities from the oxide.
REFERENCES:
patent: 2904713 (1959-09-01), Herasus et al.
patent: 3275408 (1966-09-01), Winterburn
patent: 3535890 (1970-10-01), Hansen et al.
patent: 4315832 (1982-02-01), Pastor et al.
Chew Remedios K.
Gorre Luisa E.
Pastor Antonio C.
Pastor Ricardo C.
Carter Herbert T.
Hughes Aircraft Company
Karambelas A. W.
Lachman Mary E.
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