Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1981-08-03
1983-01-18
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430302, 430309, 430324, 430325, 430331, 1014631, 101464, G03F 702, G03C 500, G03F 700, F23L 1300
Patent
active
043692397
ABSTRACT:
Process for dot-etching a photopolymer layer no more than 0.015 mm thick and O.D. greater than 3.0 in the 350 to 400 nm region containing tone correctable image comprised of polymeric dots and lines having hardened upper skin which rests on softer undervolume having less degree of polymerization or hardening wherein a staging solution comprising a film forming hydrocarbon resin Mn of 500 to 3000 containing greater than 50% by weight aliphatic hydrocarbons, 25 to 50% by weight; aliphatic hydrocarbon solvent inert to photopolymer layer, 50 to 75% by weight, and optionally a dye or colorant and/or particulate material is applied to areas desired to protect; the solution is dried; the dot and line image is reduced by undercutting by mechanical action with a solvent of the softer undervolume and removing hardened polymer from the edges of the image; and the stage is removed by solvent therefor.
REFERENCES:
patent: 4173673 (1979-11-01), Bratt et al.
Feinberg Bernard
O'Neil James W.
E. I. Du Pont de Nemours and Company
Schilling Richard L.
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