Process for preparation of a stencil or resist image

Details Process for preparation of a stencil or resist image Process for preparation of a stencil or resist image

1985-12-06

1988-01-05

Lawrence, Evan K.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Post imaging process, finishing, or perfecting composition...

1566591, 156902, 156904, 204 15, 427 96, 427 98, 427259, 427307, 430109, G03G 1320, B05D 302, B05D 310, B05D 512

Patent

active

047176393

ABSTRACT:
Process for formation of a hardened, insoluble or crosslinked stencil or resist image on a substrate, e.g., having a metal surface such as copper, and modifying the substrate or image surface comprising:

REFERENCES:
patent: 4078102 (1978-03-01), Bendz et al.
patent: 4157936 (1979-06-01), Piazza
patent: 4537799 (1985-08-01), Dorey et al.

Affiliated with

Also associated with

Rating

Process for preparation of a stencil or resist image does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparation of a stencil or resist image, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparation of a stencil or resist image will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-8712