Chemistry: electrical and wave energy – Processes and products
Patent
1980-09-08
1981-10-13
Lawrence, Evan K.
Chemistry: electrical and wave energy
Processes and products
204224R, C25D 502
Patent
active
042946697
ABSTRACT:
An apertured plating mask having a polyurethane layer thereon to enhance the sealing thereof to a metal has been provided. The plating mask has a substantially smooth layer for contact with a metal as well as a polyurethane covering of the inner perimeter of the apertures of the plating mask whereby definition of selected areas for plating is enhanced. The apertured plating mask is fabricated by a unique molding process wherein a fabricated mask blank is positioned in a mold member, polyurethane is poured through and over the mask blank, cured and treated in the mold member to provide the apertured mask with a polyurethane layer having a substantially smooth surface. Also, a process and apparatus are provided for plating selected areas of a metal wherein a metal is contacted on one surface with a rubber-covered rigid plate and on the opposite surface with an apertured plating mask having a layer of polyurethane with a smooth surface thereon. A plating solution is applied through the apertures of the plating mask to selected areas of the metal as defined by the polyurethane and energized to provide the desired plated area.
REFERENCES:
patent: 3835017 (1974-09-01), Mentone et al.
patent: 3974056 (1976-08-01), Jogwick
Lincoln Howard P.
Reddinger Donald M.
Buffton Thomas H.
GTE Products Corporation
Lawrence Evan K.
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