Process for plating metals onto various substrates in an adheren

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area

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Details

205126, 205164, 205167, 205169, 205187, 205205, 205210, 205219, C25D 502, C25D 556, C25D 534, C23C 2802

Patent

active

055475590

ABSTRACT:
The invention described provides a process for direct electroplating on activated surfaces substantially without the formation of a smut layer and thereby improving the adhesion of the plated deposit to the surface. The use of divalent or tetravalent sulfur compounds and/or cathodic electrocleaning is proposed between activation of the surface and electroplating of the surface.

REFERENCES:
patent: 2606866 (1952-08-01), Neish
patent: 2699425 (1955-01-01), Nieter
patent: 3099608 (1963-07-01), Radovsky et al.
patent: 3819497 (1974-06-01), Grunwell et al.
patent: 4270986 (1981-06-01), Smith
patent: 4279948 (1981-07-01), Kukanskis et al.
patent: 4608275 (1986-08-01), KuKanskis et al.
patent: 4756930 (1988-07-01), Kukanskis et al.
patent: 4863758 (1989-09-01), Rhodenizer
patent: 4891069 (1990-01-01), Holtzman et al.
patent: 4952286 (1990-08-01), Bladon et al.
patent: 4976990 (1990-12-01), Bach et al.
patent: 5238550 (1993-08-01), Burress
patent: 5262041 (1993-11-01), Gulla
patent: 5342501 (1994-08-01), Okabayashi

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