Process for plasma-enhanced chemical vapor deposition of anti-fo

Details Process for plasma-enhanced chemical vapor deposition of anti-fo Process for plasma-enhanced chemical vapor deposition of anti-fo

1994-04-19

1996-01-30

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427491, 427534, 427536, 427539, B05D 306

Patent

active

054879205

ABSTRACT:
A process for the plasma enhanced vapor deposition of a silicon-containing compound having one to three Si atoms onto a surface of glass, mirror, microchip or polymer substrates in flat or complex shape to provide thereon anti-fog and/or anti-scratch coating(s) is provided. The surface modifying step is conducted with a plasma composition derived from a gas stream consisting essentially of from about 80 to 40 mole percent N.sub.2 O and from about 20 to 60 mole percent CO.sub.2.

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