Process for plasma-chemical cleaning prior to PVD or PECVD coati

Details Process for plasma-chemical cleaning prior to PVD or PECVD coati Process for plasma-chemical cleaning prior to PVD or PECVD coati

1991-11-01

1992-08-04

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 427 57, 4272481, 427295, 427318, B05D 306

Patent

active

051357755

ABSTRACT:
The invention provides a process for cleaning and subsequent coating of metal surfaces of substrates. The metal surfaces are cleaned with a microwave-excited plasma using oxygen and hydrogen, alternately, as a working gas. The cleaned metal surface is coated by physical vapor deposition (PVD) or plasma enhanced chemical vapor deposition (PECVD).

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