Chemistry: natural resins or derivatives; peptides or proteins; – Peptides of 3 to 100 amino acid residues – Chemical aftertreatment – e.g. – acylation – methylation – etc.
Patent
1996-12-10
1997-10-14
Achutamurthy, Ponnathapura
Chemistry: natural resins or derivatives; peptides or proteins;
Peptides of 3 to 100 amino acid residues
Chemical aftertreatment, e.g., acylation, methylation, etc.
530317, 530402, 530406, 530300, 568308, 568414, 562463, 562577, 560 53, 560 171, 564169, 564199, 561443, 561502, C07K 1107, C07C 6747
Patent
active
056774230
ABSTRACT:
A process for removing .beta.-hydroxy groups from .beta.-hydroxy-containing compounds is disclosed. The process involves the use of a retro-aldol-promoting reagent selected from the group of trimethylamine-N-oxide, triethylamine-N-oxide, trimethylamine-N-oxide-hydrate, and trimethylamine-hydrate and requires dissolution of the substrate in an aprotic solvent and reaction under elevated temperatures. The process is broadly applicable to a variety of substrates including complex cyclic peptides, linear peptides, and non-peptides.
REFERENCES:
patent: 5057493 (1991-10-01), Takesako et al.
patent: 5059540 (1991-10-01), Bailey
patent: 5158876 (1992-10-01), Takesako et al.
patent: 5200505 (1993-04-01), Takesako et al.
patent: 5260214 (1993-11-01), Takesako et al.
J. Org. Chem., 1981, 46, 4789-4791.
J. Antibiotics, Sep. 1991, vol. 44, No. 9, 925-933.
J. Antibiotics, Sep. 1991, vol. 44, No. 9, 919-924.
J. Molecular Structure (Theochem), 180 (1988) 383-387.
Achutamurthy Ponnathapura
Boone David E.
Cantrell Paul R.
Collins Daniel W.
Eli Lilly and Company
LandOfFree
Process for performing retro-aldol reaction does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for performing retro-aldol reaction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for performing retro-aldol reaction will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1556344