Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – With material removal by etching – laser ablation – or...
Patent
1992-04-09
1994-07-05
Dang, Thi
Superconductor technology: apparatus, material, process
Processes of producing or treating high temperature...
With material removal by etching, laser ablation, or...
505725, 505728, 505730, 156655, 156656, 427 62, H01L 2100
Patent
active
053267478
ABSTRACT:
A process for patterning layered thin films comprising a bottom oxide superconductor (1) layer deposited on a substrate (3) and another thin film (2) deposited on the bottom superconductor layer and consisting of insulator, ordinary conductor or oxide superconductor having a different crystal orientation from the bottom superconductor layer. The bottom superconductor layer (1) is subjecting to heat-treatment before another thin film (2) is deposited thereon. The heat-treatment can be carried out under a first condition in ultra high-vacuum at a temperature which is lower than the oxygen-trap temperature (T.sub.trap) at which oxygen can enter into the oxide superconductor but is higher than a temperature which is lower by 100.degree. C. than the oxygen-trap temperature (T.sub.trap -100.degree. C.) or under a second condition in an atmosphere containing oxygen of high purity at a temperature which is higher than the oxygen-trap temperature (T.sub.trap) but is lower than a film forming temperature of the first thin film of oxide superconductor.
REFERENCES:
patent: 5106823 (1992-04-01), Creuzet et al.
Jia et al., "SiO.sub.2 and Si.sub.3 N.sub.4 Passivation Layers on Y-Ba-Cu-O Thin Films," J. Appl. Phys., vol. 66, No. 1, pp. 452-454 (Jul. 1989).
Iiyama Michitomo
Inada Hiroshi
Dang Thi
Sumitomo Electric Industries Ltd.
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