Process for passivating treatment of piping system for high-puri

Details Process for passivating treatment of piping system for high-puri Process for passivating treatment of piping system for high-puri

1996-03-08

1998-05-05

Beck, Shrive

Metal treatment

Process of modifying or maintaining internal physical...

Processes of coating utilizing a reactive composition which...

148286, C23C 812

Patent

active

057468419

ABSTRACT:
A high-concentration ozone gas having a concentration of at least 50 VOL % of ozone in the ozone-oxygen system is acted within the temperature range of a normal temperature to 60.degree. C. on an ultrapurity-gas piping system for use in a semiconductor manufacturing apparatus and the like or on a metal component part for use in an ultrahigh-vacuum apparatus to form a passivation film on the interior metal surface thereof.

REFERENCES:
patent: 5224998 (1993-07-01), Ohmi et al.
patent: 5226968 (1993-07-01), Ohmi et al.

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