Process for obtaining a homogeneous planar magnetization layer i

Details Process for obtaining a homogeneous planar magnetization layer i Process for obtaining a homogeneous planar magnetization layer i

1982-09-13

1984-05-29

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 531, 427128, 427130, B05D 306

Patent

active

044515006

ABSTRACT:
The invention relates to a process making it possible to obtain at least one homogeneous planar magnetization layer in a material constituted by a ferrimagnetic garnet film epitaxied on an amagnetic substrate.
According to this process, at least one implantation of ions, with the exception of ions of gaseous elements and those of metallic elements occurring in the composition of the solvent is performed in the film at a high dose. The film and substrate are annealed in order to recrystallize in monocrystalline form that part of the film made amorphous by implantation.
Application to the production of magnetic bubble memories.

REFERENCES:
Thin Solid Films, vol. 60, No. 1, Jun. 1979.
Applied Physics, vol. 21, No. 2, Feb. 1980.
IEEE Transactions of Magnetics, vol. MAG-16, No. 5, Sep. 1980.
IBM Technical Disclosure Bulletin, vol. 23, No. 9, Feb. 1981, J. C. DeLuca et al., p. 4345.
Physical Review Letters, vol. 43, No. 19, Nov. 1979, P. Hansen et al., pp. 1444-1447.

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