Process for modifying a hierarchical mask layout

Details Process for modifying a hierarchical mask layout Process for modifying a hierarchical mask layout

1996-08-15

1999-03-23

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

364488, 364489, 364490, 364491, G03F 900, H01J 37302

Patent

active

058857346

ABSTRACT:
A binary mask layout design arranged hierarchically to include a plurality of levels is modified to include optical proximity effect corrections or phase shifting layers. This is accomplished by beginning at the lowest level of the hierarchy and modifying elements or cells in the design. Any modifications that are uniform to corresponding cells throughout the level are placed in the same level in the hierarchy. Any modifications that apply only to selected cells in the level are placed in a higher level in the hierarchy. The process is repeated for all levels in the hierarchy.

REFERENCES:
patent: 5079717 (1992-01-01), Miwa
patent: 5249133 (1993-09-01), Batra
patent: 5308722 (1994-05-01), Nistler
patent: 5517607 (1996-05-01), Nishimura et al.
patent: 5663893 (1997-09-01), Wampler et al.

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