Process for measuring the dimensions of a spacer

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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356376, G01N 2186

Patent

active

051031043

ABSTRACT:
A process for measuring the dimensions of a spacer consisting in forming in a substrate (1) an array of parallel stripes (2), having a rectangular cross section; forming spacers (7) on the lateral edges (6) of the parallel stripes (2); lighting the array through a monochromatic light beam to supply a diffraction pattern, the envelope of which exhibits a major lobe and secondary lobes; measuring the sum of light intensities of a predetermined number of spots pertaining to the first secondary lobe; and deducting therefrom the width l and angle .theta. of the spacer (7) according to the following formulas:

REFERENCES:
patent: 4690565 (1987-09-01), Kato et al.
patent: 4835385 (1989-05-01), Kato et al.
patent: 4842411 (1989-06-01), Wood
patent: 4949024 (1990-08-01), Matsuura
patent: 5024949 (1991-08-01), Greenberg et al.
Publication, IBM Technical Disclosure Bulletin, "System to Satisfy the Residual First Quartz Process Requirement", vol. 21, No. 11, Apr. 1979, by Ananthakrishnan.
Publication, Patent Abstracts of Japan, "Measuring Method for Rate of Removal of Coating Film", by Kamidera, vol. 5, No. 201, Dec. 19, 1981.

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