Process for measuring surface topography using atomic force micr

Details Process for measuring surface topography using atomic force micr Process for measuring surface topography using atomic force micr

1993-12-27

1995-01-24

Williams, Hezron E.

Measuring and testing

Surface and cutting edge testing

Roughness

G01B 528

Patent

active

053833546

ABSTRACT:
Accuracy and repeatability of atomic force microscopy (AFM) are improved by coating a single crystal silicon probe tip with a layer of carbon. The carbon-coated probe tip is brought into contact with a specimen surface, and is scanned across the area of interest. The carbon coating improves the interaction between the probe tip and specimen surface, particularly insulating surfaces, by reducing probe tip damage and minimizing charge build-up.

REFERENCES:
patent: 4943720 (1990-07-01), Jones
patent: 5010249 (1991-04-01), Nishikawa
patent: 5047649 (1991-09-01), Hodgson et al.
patent: 5051379 (1991-09-01), Bayer et al.
patent: 5066358 (1991-11-01), Quate et al.
patent: 5120959 (1992-06-01), Tomita
patent: 5171992 (1992-12-01), Clabes et al.
patent: 5182452 (1993-01-01), Niwa et al.
patent: 5266801 (1993-11-01), Elings et al.
patent: 5272913 (1993-12-01), Toda et al.
Mariko Yamaki et al., "Efficient microtip fabrication with carbon coating and electron beam deposition for atomic force microscopy", J. Vac. Science Tech., Nov./Dec. '92, vol. 10, No. 6, Part B, pp. 2447-2450.
David Keller et al., "Sharp, vertical-walled tips for SFM imaging of steep or soft samples", Ultramicroscopy vol. 42-44, Part B, Jul. 1992, pp. 1481-1489.
Heinz H. Busta, "Novel Applications Employing LPCVD Tungsten", CVD Tungsten Tech., Oct. 6, 1987 Continuing Education In Engineering, Univ. Extension, Univ. of California, Berkeley, pp. 1-30.

Affiliated with

Also associated with

Rating

Process for measuring surface topography using atomic force micr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for measuring surface topography using atomic force micr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for measuring surface topography using atomic force micr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1461627