Process for manufacturing thin films by multi-layer deposition

Details Process for manufacturing thin films by multi-layer deposition Process for manufacturing thin films by multi-layer deposition

1993-09-13

1997-07-15

King, Roy V.

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Coating

505474, 505475, 505500, 505729, 505731, 505732, 505742, 427 62, 4272557, 427596, B05D 512, C23C 1400, C23C 1600

Patent

active

056483210

ABSTRACT:
Described is a process for manufacturing thin films by periodically depositing (DEP) a number of block layers consisting of different base materials on a substrate (multilayer deposition), wherein the thickness of the layers (LT) is restricted to one to 20 monolayers and deposition as well as crystallization of the thin film is completed at approximately constant temperature without performing a separate annealing step. The method can be used to produce thin films of high-T.sub.c -superconductors. It allows a better control of the crystal growth of ternary or higher compounds with comparatively large unit cells.

REFERENCES:
Webb et al, "Growth of high Tc superconducting thin films using molecular beam epitaxy techniques", Appl. Phys. lett. 51(15) Oct. 1987, pp. 1191-1193.
Bae et al, "Molecular beam deposition of Dy.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-8 (001) high-temperature superconductor thin films", J. Vac. Sci. Technol. A 10(2) Mar./Apr. 1992 pp. 281-283.
Hellman et al, "Molecular-beam epitaxy and deposition of high Tc superconductors", J. Vac. Sci. Technol. B6(2) Mar./Apr. 1988 pp. 799-803.

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