Process for manufacturing semiconductor structures by sputter et

Details Process for manufacturing semiconductor structures by sputter et Process for manufacturing semiconductor structures by sputter et

1976-10-07

1978-04-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C23C 1500

Patent

active

040826376

ABSTRACT:
A process for manufacturing semiconductor devices, particularly monocrystalline structures by sputter etching, wherein the electric discharge is effected in a rarefied atmosphere, the components of which are Argon and Hydrogen, or Argon and H.sub.2 O, or inert gas and a gas developing Hydrogen ions.

REFERENCES:
patent: 3868271 (1975-02-01), Poley et al.
R. T. Tsui et al., "Removal of Polymerized Photoresists by Atomic & Molecular Hydrogen in a Discharge," IBM Tech. Disc. Bull., vol. 9, Feb. 1967, p. 122.

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