Process for manufacturing semiconductor integrated circuit devic

Details Process for manufacturing semiconductor integrated circuit devic Process for manufacturing semiconductor integrated circuit devic

1992-06-10

1995-05-23

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430319, G03F 900

Patent

active

054180929

ABSTRACT:
A mask and an exposure method are provided in which a wafer is irradiated with light transmitted through the mask formed with a predetermined pattern having a shielding region and a transmissive region, to transfer the pattern of said mask. In particular, the mask includes a first mask and a second mask. The first mask is formed with a pattern having a shielding region and a transparent region, while the second mask is formed with a pattern having a phase shifter for introducing a phase difference in a portion of the transmission light. The first and second masks are superposed relative to one another over the wafer so that a clear image may be focused on said wafer by making use of interference of said transmission light caused by said first and second mask. It is to be noted that this arrangement also has the advantage of not transferring images of foreign substances stuck on the back of the mask, to the wafer.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5248575 (1993-09-01), Ogoshi

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