Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acids and salts thereof
Patent
1997-05-29
1998-06-09
Mullis, Jeffrey
Organic compounds -- part of the class 532-570 series
Organic compounds
Carboxylic acids and salts thereof
562510, 562598, 562599, C07C 6724, C07C 6700
Patent
active
057636516
ABSTRACT:
A process for the manufacture of polyene esters or polyene acids comprises reacting a polyene O,O-dialkylacetal of di(O,O-dialkylacetal) with a vinylketene acetal or analogue thereof in the presence of a Lewis acid, hydrolyzing the reaction mixture depending on the vinylketene acetal used, subsequently cleaving alcohol under strongly basic conditions from the polyene derivative produced at this stage and, where the desired ester or carboxy group is still not present, performing the respective conversion. Certain intermediates in this process form a further aspect of the invention. The final products are primarily carotenoids which can be used appropriately, e.g. as colorants and pigments for foodstuffs, animal products etc.
REFERENCES:
patent: 4937308 (1990-06-01), Kraus et al.
I. Fleming et al., Tetrahedron Letters, No. 34, pp. 3209-3212 (1979).
I. Fleming, Chimia 34, No. 6, pp. 265-271 (1980).
I. Paterson et al., Tetrahedron Letters 22, No. 29, pp. 2833-2836 (1981).
H. F. Chow et al., Tetrahedron Letters 26, No. 3, pp. 397-400 (1985).
Hertler et al., J. Org. Chem., vol. 53, (15), pp. 3532-3539 (1988).
Yamamoto, et al., J. Chem. Soc., Chem. Commun., pp. 1639-1640 (1988).
Epstein William H.
Johnston George W.
Mullis Jeffrey
Parise John P.
Roche Vitamins Inc.
LandOfFree
Process for manufacturing polyene esters and acids does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for manufacturing polyene esters and acids, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for manufacturing polyene esters and acids will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2201202