Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
Reexamination Certificate
2007-06-26
2007-06-26
Barts, Samuel (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Silicon containing
Reexamination Certificate
active
10856194
ABSTRACT:
Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.
REFERENCES:
patent: 4613491 (1986-09-01), Jung et al.
patent: 6251057 (2001-06-01), Jung et al.
patent: 6392077 (2002-05-01), Jung et al.
Kang et al., “Phosphonium Chloride-Catalyzed Dehydrochlorinative Coupling Reactions of Alkyl Halides with Hydridochlorosilanes”,Organometallics, 22:529-534 (2003).
Benkeser et al., “Silylation of Organic Halides. A New Method of Forming the Carbon-Silcon Bond”,Journal of American Chemical Society, 91:13, p. 3666 (Jun. 18, 1969).
Furuya et al., “The Condensation Reaction of Trichlorosilane with Allylic Chlorides Catalyzed by Copper Salts in the Presence of a Tertiary Amine”,Journal of Organometallic Chemistry, 96:C1-C3 (1975).
Corriu et al., “Synthesis and reactivity of bis(triethoxysilyl)methane, tris(triethoxysilyl)methane and some derivatives”, Journal of Organometallic chemistry 562:79-88, (1998).
Arkles Barry C.
Janeiro Benigno A.
Akin Gump Strauss Hauer & Feld & LLP
Barts Samuel
Gelest Inc.
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