Process for manufacturing lithography masks

Details Process for manufacturing lithography masks Process for manufacturing lithography masks

1979-06-27

1982-05-04

Morgenstern, Norman

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

156634, 156636, 1566591, 427259, 427264, 427265, 427266, 427282, 427287, 427304, 427305, 430324, 430325, C23F 100

Patent

active

043282989

ABSTRACT:
A method for manufacturing X-ray lithography masks containing features smaller than 1 micron in size and having conductive or non-conductive substrates. The method involves the initial deposition, as by evaporation, of a very thin coating of a strong X-ray absorber such as gold. A layer of photoresist is applied to the initial gold layer and exposed and developed to remove the photoresist in the exposed areas. Thereafter, the mask is submerged in an electroless gold plating bath. I have discovered that metals suitable for electroless plating are autocatalytic in nature. Accordingly, additional gold from the bath is preferentially deposited on the exposed first gold layer and is permitted to build to the desired thickness.

REFERENCES:
patent: 2702253 (1955-02-01), Bergstrom
patent: 2924534 (1960-02-01), Morse
patent: 3367792 (1968-02-01), Levine
patent: 3558290 (1971-01-01), Baier et al.
patent: 3957552 (1976-05-01), Ahn et al.
patent: 4001061 (1977-01-01), Ahn et al.

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