Process for manufacturing isolated semiconductor components in a

Details Process for manufacturing isolated semiconductor components in a Process for manufacturing isolated semiconductor components in a

1992-08-20

1995-02-07

Fourson, George

Fishing, trapping, and vermin destroying

437 90, 437 91, 437 92, H01L 2176

Patent

active

053875370

ABSTRACT:
A process for manufacturing isolated semiconductor components in a semiconductor wafer of the type used in bipolar technology. In this process, polycrystalline silicon is deposited in a recess in a silicon substrate whose walls are insulated by a silicon nitride layer except for an opening formed in this nitride layer at the bottom of said recess. Then, the polycrystalline silicon is recrystallized so as to become monocrystalline silicon by thermal heating from the "nucleus" formed by the underlying silicon in said opening.

REFERENCES:
patent: 4111724 (1978-09-01), Ogiue et al.
patent: 4445268 (1984-05-01), Hirao
patent: 4494303 (1985-01-01), Celler et al.
patent: 4498951 (1985-02-01), Tamura et al.
patent: 4523962 (1985-06-01), Nishimura
patent: 4565584 (1986-01-01), Tamura et al.
patent: 4609407 (1986-09-01), Masao et al.
IBM Technical Disclosure Bulletin vol. 7, No. 11, Apr. 1965 pp. 1104 "Fabrication of Planar Arrays of Semiconductor Chips by Epitaxial Growth" by H. N. Yu.
Jap. J. of Applied Physics vol. 21, No. 9, Sep. 1982 pp. L564-566, "Selective Silicon Epitaxy Using Reduced Pressure Technique" by Kohetsu Tanno et al.
J. Electrochem. Soc.; Solid State Science and Technology vol. 128, No. 6, pp. 1353-1359 "The Nucleation of CVD Silicon on SiO.sub.2 and Si.sub.3 N.sub.4 Substrates" by W. A. P. Claassen et al., Jun. 1981.
Solid State Technology Aug. 1985 pp. 141-148 "Advanced Dielectric Isolation through Selective Epitaxial Growth Techniques" by John O. Borland et al, Sep. 1982.

Affiliated with

Also associated with

Rating

Process for manufacturing isolated semiconductor components in a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for manufacturing isolated semiconductor components in a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for manufacturing isolated semiconductor components in a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1110034