Process for manufacturing high-sensitivity accelerometric and gy

Details Process for manufacturing high-sensitivity accelerometric and gy Process for manufacturing high-sensitivity accelerometric and gy

1998-07-30

2000-08-29

Kwok, Helen C.

Measuring and testing

Speed, velocity, or acceleration

Acceleration determination utilizing inertial element

7350412, G01P 15125, G01P 904

Patent

active

061091065

ABSTRACT:
A movable mass forming a seismic mass is formed starting from an epitaxial layer and is covered by a weighting region of tungsten which has high density. To manufacture the mass, buried conductive regions are formed in the substrate. Then, at the same time, a sacrificial region is formed in the zone where the movable mass is to be formed and oxide insulating regions are formed on the buried conductive regions so as to partially cover them. An epitaxial layer is then grown, using a nucleus region. A tungsten layer is deposited and defined and, using a silicon carbide layer as mask, the suspended structure is defined. Finally, the sacrificial region is removed, forming an air gap.

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Kuehnel, Wolfgang et al., "A Surface Micromachined Silicon Accelerometer With On-Chip Detection Circuitry, " Elsevier Science Sensors and Actuators, vol. 45, pp. 7-16, 1994.
Gabrielson, Thomas B., "Mechanical-Thermal Noise In Micromachined Acoustic and Vibration Sensors," IEEE Transactions On Electron Devices, vol. 40. No. 5, pp. 903-909, May 1993.

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