Process for manufacturing half-tone phase shifting mask blanks

Details Process for manufacturing half-tone phase shifting mask blanks Process for manufacturing half-tone phase shifting mask blanks

2006-10-24

2009-10-13

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07601468

ABSTRACT:
For efficiently manufacturing half-tone phase shifting mask blanks having uniform product qualities, which enables the prevention of optical property variations when the blanks are mass-produced, there is provided a process for manufacturing half-tone phase shifting mask blanks each having a phase shifting film containing at least one half-tone film on a transparent substrate, comprising the step of providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas, to form said half-tone film on said transparent substrate, wherein the formation of the half-tone film by said reactive sputtering is carried out using, as said target, a target having a metal/silicon compositional ratio selected so as to give a predetermined optical property of the half-tone film, at a reactive gas flow rate selected from a region where a discharge characteristic is stabilized against a change in the flow rate of the reactive gas.

REFERENCES:
patent: 4201645 (1980-05-01), Riegert
patent: 5556520 (1996-09-01), Latz
patent: 5942356 (1999-08-01), Mitsui et al.
patent: 6153341 (2000-11-01), Mitsui et al.
patent: 6511778 (2003-01-01), Okazaki et al.
patent: 6783634 (2004-08-01), Nozawa et al.
patent: 2001/0007731 (2001-07-01), Inazuki et al.
patent: 09-179288 (1997-07-01), None
patent: 2989156 (1999-12-01), None
patent: 2002-72443 (2002-03-01), None
patent: 2002-189283 (2002-07-01), None
patent: 2002-189284 (2002-07-01), None
patent: 1992-0018236 (1992-10-01), None
patent: 10-0561895 (2006-03-01), None
Ohring, “The Materials Science of Thin Films” (1992, Academic Press).
“Thin Film Process II”, edited by Vossen et al (1991, Academic Press).
Closed loof controlled reactive dual magnetron sputtering (1999, Advanced Energy Industries, Inc.).

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