Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-11-28
2006-11-28
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C204S192120
Reexamination Certificate
active
07141339
ABSTRACT:
For efficiently manufacturing half-tone phase shifting mask blanks having uniform product qualities, which enables the prevention of optical property variations when the blanks are mass-produced, there is provided a process for manufacturing half-tone phase shifting mask blanks each having a phase shifting film containing at least one half-tone film on a transparent substrate, comprising the step of providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas, to form said half-tone film on said transparent substrate, wherein the formation of the half-tone film by said reactive sputtering is carried out using, as said target, a target having a metal/silicon compositional ratio selected so as to give a predetermined optical property of the half-tone film, at a reactive gas flow rate selected from a region where a discharge characteristic is stabilized against a change in the flow rate of the reactive gas.
REFERENCES:
patent: 5942356 (1999-08-01), Mitsui et al.
patent: 6153341 (2000-11-01), Mitsui et al.
patent: 6511778 (2003-01-01), Okazaki et al.
patent: 6783634 (2004-08-01), Nozawa et al.
Ishihara Shigenori
Mitsui Masaru
Suzuki Toshiyuki
Hoya Corporation
Nixon & Vanderhye P.C.
Rosasco S.
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