Process for manufacturing an optical recording medium

Details Process for manufacturing an optical recording medium Process for manufacturing an optical recording medium

1990-10-18

1992-09-29

Pianalto, Bernard

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427162, 427240, 427299, 427402, B05D 506

Patent

active

051512955

ABSTRACT:
A method of depositing the layers of an optical recording medium to their requisite thicknesses is disclosed in which optical monitoring of the reflectivity of a first dielectric layer during deposition is used to determine the deposition rate. The reflectivity is monitored to determine the time period in which the reflectivity reaches a maximum or minimum value, which occurs when the layer is a quarter wave thick. The deposition rate is derived from that time period, and the deposition is continued for a time in accordance with the deposition rate until the requisite thickness of the first dielectric layer is obtained. The second dielectric layer is deposited for a lesser time period in accordance with the deposition rate which has been optically derived during deposition of the first dielectric layer.

REFERENCES:
patent: 3492491 (1970-12-01), Beeh
patent: 3773548 (1973-11-01), Baker et al.
patent: 4457794 (1984-06-01), Kotera et al.
patent: 4676646 (1990-06-01), Strand et al.
Optical Interference Method For The Approximate Determination Of Refractive Index And Thickness Of A Transparent Layer by Alvin M. Goodman, published in the Sep. 1, 1978 issue of Applied Optics.
Thickness Measurements Of Film On Transparent Substrates By Photoelectric Detection Of Interference Fringes by Pierce and Venard, published in the reviews of Scientific Instruments, vol. 45, No. 1, Jan. 1974.

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