Process for manufacturing an electro-mechanical grating device

Details Process for manufacturing an electro-mechanical grating device Process for manufacturing an electro-mechanical grating device

1998-12-18

2001-05-29

Gulakowski, Randy (Department: 1746)

Etching a substrate: processes

Forming or treating electrical conductor article

C216S038000, C216S039000, C264S001100

Reexamination Certificate

active

06238581

ABSTRACT:

CROSS REFERENCE TO RELATED APPLICATIONS
Reference is made to U.S. Ser. No. 09/216,289 filed Dec. 18, 1998 entitled A Mechanical Grating Device, and further reference is made to U.S. Ser. No. 09/215,973 filed Dec. 18, 1998 entitled Method For Producing Coplanar Surface Structures.
FIELD OF THE INVENTION
This invention relates to the field of the fabrication of a device which modulates an incident light beam. The device is a mechanical grating device. More particularly, this invention discloses a method for manufacturing a mechanical grating device, wherein the device manufactured according to the inventive method possesses a significant improvement in the output of the diffracted light beam.
BACKGROUND OF THE INVENTION
Advances in micromachining technology have given rise to a variety of Micro-electromechanical systems (MEMS) including light modulators for low cost display applications. Such modulators provide high-resolution, high operating speeds (KHz frame rates), multiple gray scale levels, color adaptability, high contrast ratio, and compatibility with VLSI technology. One such modulator has been disclosed in U.S. Pat. No. 5,311,360, issued May 10, 1994 to Bloom et al., entitled “Method and Apparatus for Modulating a Light Beam”. This modulator is a micromachined reflective phase grating. It consists of a plurality of equally spaced deformable elements in the form of beams suspended at both ends above a substrate thereby forming a grating. The deformable elements have a metallic layer that serves both as an electrode, and as reflective surface for incident light. The substrate is also reflective and contains a separate electrode. The deformable elements are designed to have a thickness equal to &lgr;/4 where &lgr; is the wavelength of the incident light source. They are supported a distance of &lgr;/4 above, and parallel to, the substrate. When the deformable elements are actuated (for example a sufficient switching voltage is applied), the deformable elements are pulled down and the incident light is diffracted. Optical systems can intercept the diffracted light. For display applications, a number of deformable elements are grouped for simultaneous activation thereby defining a pixel, and arrays of such pixels are used to form an image. Furthermore, since gratings are inherently dispersive, this modulator can be used for color displays.
U.S. Pat. No. 5,677,783, issued Oct. 14, 1997 to Bloom et al., entitled “Method of Making a Deformable Grating Apparatus for Modulating a Light Beam and Including Means for Obviating Stiction Between Grating Elements and Underlying Substrate” discloses a method of making a deformable grating apparatus for modulating a light beam and including means for obviating stiction between grating elements and underlying substrate. Referring to
FIG. 1
, a perspective cut-away view of a prior art light modulator
10
is shown. An insulating protective layer
24
of silicon nitride topped with a buffer layer of silicon dioxide
26
is deposited on a silicon substrate
22
. This is followed by the deposition of a sacrificial silicon dioxide layer
16
. A silicon nitride layer
30
is next deposited in which is defined the deformable elements
12
. Both the thickness of the sacrificial silicon dioxide layer
16
and the silicon nitride layer
30
are critical in determining the amplitude modulation and thus the efficiency of the grating device. In order to achieve freestanding beams the sacrificial silicon dioxide layer
16
is etched away in the active area. The remaining sacrificial silicon dioxide layer
16
not removed acts as a supporting frame
14
for the deformable elements
12
. The last fabrication step provides an aluminum film (not shown) in order to enhance the reflectance of the beams and provide an electrode for application of a voltage between the deformable elements
12
and the substrate
22
.
There are many problems with this prior art device. The thickness of both the sacrificial oxide layer
16
and silicon nitride layer
30
have to each be &lgr;/4. Because these thicknesses determine the grating amplitude of the modulator, their dimensions are critical. Variations in either of these thicknesses will result in unwanted diffraction of light in the off state, as well as lower diffraction efficiency in the on state, thus lower contrast ratios. There is no freedom to adjust the thickness of the deformable element
12
for optimization of its mechanical properties.
There is no defined etch stop in the device structure during removal of the sacrificial oxide layer
16
. This requires a carefully controlled time-dependent etch to ensure that the remaining sacrificial oxide layer
16
is able act as the supporting frame
14
. The profile left by the wet etch openings between the beams leaves an uneven wall below the deformable elements
12
where they contact the supporting frame
14
. Such effects will cause variations in the electromechanical properties of the devices.
The etching process to remove the sacrificial oxide layer is also a wet process. During this wet processing step it has been seen that stiction tends to occur in that the deformable elements tend to adhere and remain adhered to the substrate. Special drying techniques can be used to overcome this problem but complicate the process. Removal of the sacrificial layer using a dry process is preferred.
U.S. Pat. No. 5,661,592, issued Aug. 26 ,1997 to Bornstein et al., entitled “Method of Making and an Apparatus for a Flat Diffraction Grating Light Valve” discloses a method for making a deformable grating apparatus which attempts to address the problems associated with this prior art device. An insulating layer is deposited on the substrate. A phosphosilicate glass (PSG) sacrificial layer is next deposited. The PSG sacrificial layer is selectively patterned removing the PSG sacrificial layer except in regions where the deformable grating elements are to be formed. The PSG is reflowed at high temperature to lower the angle of its sidewall. Silicon nitride is then deposited conformably over the PSG and patterned into deformable elements. The PSG sacrificial layer is then removed by wet etching. By selectively patterning the PSG sacrificial layer the region under the beams is more uniform relying now on the uniformity of the reflow of the PSG sacrificial layer. However the removal of the PSG sacrificial layer is still a wet process with the corresponding disadvantages as described above.
The conformal deposition of the silicon nitride over the step height formed by the patterned PSG sacrificial layer region also has topography determined by the step height. In patterning the deformable elements this topography will limit the minimum spacing between the deformable elements. Increased spacing between elements will cause increased light scattering decreasing the efficiency of the grating. The use of a PSG sacrificial layer also requires a high temperature reflow step that would complicate its integration with CMOS circuitry on the same substrate.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a method for manufacturing a mechanical grating device. The mechanical grating device has to have equal actuation conditions for the deformable elements throughout the whole device in order to improve the diffraction efficiency of the device.
The object is achieved with a method for manufacturing a mechanical grating device comprising the steps of:
providing a spacer layer on top of a protective layer which covers a substrate;
etching a channel entirely through the spacer layer;
depositing a sacrificial layer at least as thick as the spacer layer;
rendering the deposited sacrificial layer optically coplanar by chemical mechanical polishing;
providing a tensile ribbon layer completely covering the area of the channel;
providing a conductive layer patterned in the form of a grating;
transferring the conductive layer pattern to the ribbon layer and etching entirely through the ribbon layer; and
removing entirely the sacrificial layer from the channel.
Advantages
This m

Affiliated with

Also associated with

Rating

Process for manufacturing an electro-mechanical grating device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for manufacturing an electro-mechanical grating device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for manufacturing an electro-mechanical grating device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2557976