Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1996-02-08
1998-05-12
Jones, Deborah
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423326, 502 80, 502263, C01B 3326
Patent
active
057500851
ABSTRACT:
A process for manufacturing a silica porous material with high solid acidity, catalytic activity and adsorption ability as well as excellent crystallinity and heat resistance has the steps of adding a compound of metallic element such as Al to a waterglass, aging the resultant mixture, calcining the aged mixture to form a layered crystal, incorporating an organic substance between layers of the layered crystal, calcining the resultant layered crystal for crosslinking the layered crystal. By this process, a plurality of layers formed of SiO.sub.4 tetrahedral and metallic oxide constitute a silica porous material, and the gap between adjacent layers of the layered crystal is reduced at a crosslinking site, while the gap of the other portion is expanded to form a micro pore.
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Fukushima Yoshiaki
Inagaki Shinji
Yamada Yuri
Jones Deborah
Kabushiki Kaisha Toyota Chou Kenkyusho
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