Process for manufacturing a photomask

Details Process for manufacturing a photomask Process for manufacturing a photomask

1986-03-20

1988-04-19

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430321, 430323, 430942, 428428, G03F 900

Patent

active

047389079

ABSTRACT:
A photomask manufacturing process including step of forming on a transparent silica glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized. A resist is applied onto the silicide film and then a patterning mask is provided by light or electron beam, followed by developing step. Exposed portion of the silicide film is etched away using a dry etching process.

REFERENCES:
patent: 4661426 (1987-04-01), Matsuda et al.
patent: 4678714 (1987-07-01), Watakabe

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