Process for manufacturing a photomask

Details Process for manufacturing a photomask Process for manufacturing a photomask

1989-10-23

1991-01-15

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430323, G03F 100

Patent

active

049853198

ABSTRACT:
A photomask manufacturing process including a step of forming metal silicide film on a transparent silica glass substrate. A resist is applied onto the metal silicide film and then a patterning mask is provided by light or electron beam, followed by developing step. Exposed portions of the metal silicide film is etched away using a dry etching process.

REFERENCES:
patent: 4876164 (1989-10-01), Watakabe et al.

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