Metal working – Barrier layer or semiconductor device making
Patent
1999-05-07
2000-05-16
Graybill, David E.
Metal working
Barrier layer or semiconductor device making
29 2542, H01L 2100, H01L 2164, H01G 700
Patent
active
060631406
ABSTRACT:
A capacitor is made from a laminated structure having multiple layers of metallized, dielectric film and having a solderable, metal termination at each of two ends. The metal termination at each of the ends is generally rectangular with a top edge, a bottom edge, and two side edges and is finished so as to have a finished surface, which is characterized by a three-dimensional pattern of ridges having solderable surfaces and grooves having solderable surfaces. The ridges alternate with the grooves and the ridges and the grooves at both of the ends are parallel to the side edges. Thus, the three-dimensional pattern facilitates reflow soldering to the finished surface.
REFERENCES:
patent: 4297773 (1981-11-01), Galvagni
patent: 4463407 (1984-07-01), Berger et al.
patent: 4531268 (1985-07-01), Rayburn
patent: 4580190 (1986-04-01), Rayburn
patent: 4613516 (1986-09-01), Ham et al.
patent: 4741077 (1988-05-01), Langlois
patent: 4959652 (1990-09-01), Hirama
patent: 5053916 (1991-10-01), Weekamp et al.
patent: 5055965 (1991-10-01), Rayburn
patent: 5083234 (1992-01-01), Lehto et al.
patent: 5128827 (1992-07-01), Yokotani et al.
patent: 5144523 (1992-09-01), Pageaud et al.
patent: 5258153 (1993-11-01), Chapas et al.
patent: 5898561 (1999-04-01), Mandelcorn et al.
Graybill David E.
Illionis Tool Works, Inc.
LandOfFree
Process for manufacturing a metallized film capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for manufacturing a metallized film capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for manufacturing a metallized film capacitor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-255147