Process for manufacturing a bipolar power transistor having a hi

Fishing – trapping – and vermin destroying

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437143, 437154, 148DIG10, H01L 21265

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055696120

ABSTRACT:
There is described a bipolar power transistor with high breakdown voltage, obtained in a heavily doped semiconductor substrate of the N type, over which a lightly doped N type layer, constituting a collector region of the transistor, is superimposed. The transistor has a base region comprising a heavily doped P type diffusion, which extends into the lightly doped N type layer from a top surface. The transistor further includes an emitter region constituted by a heavily doped N type diffusion extending from the top surface within said heavily doped P type diffusion. The heavily doped P type diffusion is obtained within a deep lightly doped P type diffusion, extending from said top surface into the lightly doped N type layer and formed with acceptor impurities of aluminum atoms.

REFERENCES:
patent: 4074293 (1978-02-01), Kravitz
patent: 4154632 (1979-05-01), Mochizuki et al.
patent: 4416708 (1983-11-01), Abdoulin et al.
patent: 4559696 (1985-12-01), Anand et al.
patent: 4667393 (1987-05-01), Ferln et al.
patent: 4780430 (1988-10-01), Musumeci et al.
patent: 4805004 (1989-02-01), Gandalfi et al.
patent: 4820656 (1989-04-01), Schulze et al.
patent: 4999309 (1991-03-01), Buynoski
patent: 5192712 (1993-03-01), Aronowitz et al.
patent: 5436179 (1995-07-01), Erdeljac et al.
European Search Report from European Patent Application No. 93830276.7, filed Jun. 28, 1995.
Solid State Technology, vol. 19, Mar. 1976, Washington, US, pp. 29-32, A. H. Berman, "Glass Passivation Improves High Voltage Transistors".

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