Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Silicon containing or process of making
Reexamination Certificate
2005-04-12
2005-04-12
Nguyen, Ngoc-Yen (Department: 1754)
Catalyst, solid sorbent, or support therefor: product or process
Catalyst or precursor therefor
Silicon containing or process of making
C502S008000, C502S209000, C502S504000
Reexamination Certificate
active
06878668
ABSTRACT:
A method for manufacturing of an attrition resistant vanadium/phosphorous oxide catalyst involving forming an aqueous slurry comprising; vanadium/phosphorous oxide catalyst or vanadium/phosphorous oxide catalyst precursor particles, an aqueous solution of H3PO4, and optionally an aqueous colloidal silica sol, an aqueous polysilicic acid solution or mixture thereof and then spray drying the slurry to form attrition resistant catalyst precursor followed by calcining/activating the spray dried precursor. Such a catalyst is particularly useful in oxidation processes such as the catalytic air oxidation of butane to maleic anhydride.
REFERENCES:
patent: 4127591 (1978-11-01), Kamimura
patent: 4317778 (1982-03-01), Blum et al.
patent: 4351773 (1982-09-01), Milberger
patent: 4677084 (1987-06-01), Bergna
patent: 4769477 (1988-09-01), Bergna
patent: 5128114 (1992-07-01), Schwartz
patent: 5302566 (1994-04-01), Schwartz
patent: 6107238 (2000-08-01), Contractor et al.
U.S. Appl. No. 09/163,680 filed Sep. 30, 1998.
U.S. Provisional Application 06/109,403 filed Nov. 20, 1998.
Cline, Jr. Dwain T.
Schwartz Jo-Ann T.
E. I. du Pont de Nemours and Company
Nguyen Ngoc-Yen
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