Process for making optical INP devices

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 74, 427 82, 427 87, 427 91, 427162, 427163, 427166, 4272481, 427255, 4272553, 427294, B05D 306, B05D 506

Patent

active

046171924

ABSTRACT:
The invention is a process for putting down coatings of aluminum oxide on optical surfaces using electron-beam deposition in an oxygen-enriched atmosphere. Particularly good results are obtained when oxygen is flowed over or directed at the surface to be coated. Such coatings have extremely low losses compared to many conventional optical coatings and are particularly useful for anti-reflection coatings on various devices. In particular, for optical devices with indium phosphide surfaces operating at wavelengths near 1.3 .mu.m, the optical properties of aluminum oxide coatings are near optimum for anti-reflection coatings and the thermal expansion characteristics are a close match to those of indium phosphide.

REFERENCES:
patent: 3756193 (1973-09-01), Carmichael et al.
patent: 3756847 (1973-09-01), Leibowitz et al.
patent: 4160185 (1979-07-01), Tomasetti et al.
Electronic Letters 11, No. 8, "Zero Material Dispersion in Optical Fibers", pp. 176-178, Apr. 1975.
Laser Focus, "Photodiodes for Long-Wavelength Communication Systems", Dec. 1982, pp. 81-90.
Physical Vapor Deposition, by Airco Temescal (A division of Airco, Inc.) 1976.

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