Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound
Reexamination Certificate
2011-07-26
2011-07-26
Vanoy, Timothy C (Department: 1734)
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
C423S508000, C423S509000, C423S511000, C423S561100, C423S592100, C422S224000, C422S225000, C422S229000, C977S773000
Reexamination Certificate
active
07985388
ABSTRACT:
There is disclosed a process of making nano-sized or micro-sized precipitate particles. The process comprising the steps of mixing, in a reaction zone, a metal salt solution with a precipitant solution to form a precipitate, said precipitate being at least one of a metal chalcogenide, metal hydroxide and metal oxide; and applying a shear force to said mixing solutions in said reaction zone during said mixing step, wherein said shear force and the conditions within said reaction zone form said nano-sized or micro-sized precipitate particles.
REFERENCES:
patent: 6042792 (2000-03-01), Shefer et al.
patent: 6653356 (2003-11-01), Sherman
patent: 2005/0218540 (2005-10-01), Sastry et al.
patent: 2005/0260122 (2005-11-01), Li et al.
patent: 2010/0025627 (2010-02-01), Naoi et al.
patent: 2010/0055028 (2010-03-01), Scott et al.
patent: 2010/0092377 (2010-04-01), Scott et al.
patent: 2010/0119829 (2010-05-01), Karpov et al.
patent: 2010/0158790 (2010-06-01), Jakli et al.
patent: 102 23 567 (2003-12-01), None
patent: 2005-255501 (2005-09-01), None
Chen Jianfeng
Shen Zhigang
Sim Giawen
Yun Jimmy Sung Lai
Zhang Jiyao
Kilpatrick Townsend & Stockton LLP
NanoMaterials Technology Pte Ltd
Vanoy Timothy C
LandOfFree
Process for making nano-sized and micro-sized precipitate... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for making nano-sized and micro-sized precipitate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for making nano-sized and micro-sized precipitate... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2636520