Process for making identification alphanumeric code markings for

Details Process for making identification alphanumeric code markings for Process for making identification alphanumeric code markings for

1995-09-07

1997-09-16

Tsai, Jey

Semiconductor device manufacturing: process

Formation of electrically isolated lateral semiconductive...

Having substrate registration feature

438587, H01L 218246

Patent

active

056680309

ABSTRACT:
A process for fabricating identification alphanumeric code markings on the substrate of mask ROM devices is disclosed. The fabrication process comprises first forming a deposited layer on the substrate of the mask ROM device. A photoresist layer is then formed on the deposited layer. A photomask layer by is then shaped by forming a pattern on the photoresist layer that reveals the channel regions of the memory cell transistors to be programmed into the blocking state, as well as reveals the graphical pattern of the alphanumeric code marking. An etching procedure then removes the portion of the deposited layer revealing the graphical pattern of the alphanumeric code markings. The photomask layer is then removed. A code implantation procedure may precede or follow the etching procedure to facilitate the programming of the memory cells of the mask ROM device.

REFERENCES:
patent: 4364167 (1982-12-01), Donley
patent: 5051374 (1991-09-01), Kagawa et al.

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