Process for making highly reactive sub-micron amorphous titanium

Details Process for making highly reactive sub-micron amorphous titanium Process for making highly reactive sub-micron amorphous titanium

1989-08-28

1992-11-03

Russel, Jeffrey E.

Chemistry of inorganic compounds

Boron or compound thereof

Binary compound

C01B 3504

Patent

active

051607166

ABSTRACT:
A material of manufacture comprising sub-micron particulate amorphous titanium diboride formed by a process which comprises the steps of forming a powdered reaction mixture of titanium oxide, boron oxide and magnesium, exothermically reacting the reaction mixture in an atmosphere including air to yield a reacted mass containing titanium diboride and magnesia, leaching the reacted mass with a leaching solution having a pH in the range of about 0.5 to about 8, and recovering from the leaching solution sub-micron titanium diboride having a surface area of from about 25 to about 49 m.sup.2 /gm; and a material of manufacture resulting from the hot pressing of the sub-micron particulate titanium diboride material of this invention which has a hardness of from about 2800 to about 3400 Knoop, an elastic modulus from about 700 to about 813 GPa, a forming temperature of from about 1500.degree. C. or less, and a grain morphology aspect ratio of from about 2:1 to about 100:1.

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Takahashi et al., "Chemical Vapor Deposition of Titanium Diboride", Journal of Crystal Growth, vol. 26, 1974, pp. 203-209.

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