Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal
Patent
1981-01-19
1983-08-30
Carter, Herbert T.
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Radioactive metal
423253, C01G 5600
Patent
active
044016280
ABSTRACT:
A continuous process is disclosed for precipitating uranium from an aqueous solution formed by the hydrolysis of uranium hexafluoride gas. Undersized ammonium diuranate particles are formed in a first container by mixing the aqueous solution and an ammonium hydroxide solution containing about 10 to about 30% by weight ammonium. The ratio of the two solutions should be such that there are about 20 to about 30 moles of ammonium per mole of uranium. The temperature is maintained at about 30.degree. to about 50.degree. C. and the residence time in the first container is about 14 to about 57 seconds. The slurry is then transported to a second container for further particle growth where it is agitated at a temperature of about 20.degree. to 40.degree. C. for a residence time of about 2 to about 9 minutes. The resulting ammonium diuranate precipitate has a surface area of about 10 to about 20 meters squared per gram. The precipitate can then be calcined and pressed into pellets.
REFERENCES:
patent: 2466118 (1949-04-01), Miller et al.
patent: 3394997 (1968-07-01), DeHollander
patent: 3726650 (1973-04-01), Welty
patent: 3758664 (1973-09-01), Gerrald
patent: 4234550 (1980-11-01), DeHollander
Chiang Peter T.
Tiepel Erich W.
Carter Herbert T.
Fuerle R. D.
Westinghouse Electric Corp.
LandOfFree
Process for making high quality nuclear fuel grade ammonium diur does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for making high quality nuclear fuel grade ammonium diur, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for making high quality nuclear fuel grade ammonium diur will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-905402