Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2005-10-20
2010-02-09
Arbes, C. J (Department: 3729)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C029S831000, C029S842000, C029S847000, C427S250000, C427S455000
Reexamination Certificate
active
07658772
ABSTRACT:
The present invention is a process for making a matching pair of surfaces, which involves creating a network of channels on one surface of two substrate. The substrates are then coated with one or more layers of materials, the coating extending over the regions between the channels and also partially into the channels. The two coated surfaces are then contacted and pressure is applied, which causes the coatings to be pressed into the network of channels, and surface features on one of the layers of material creates matching surface features in the other, and vice versa. It also results in the formation of a composite. In a final step, the composite is separated, forming a matching pair of surfaces.
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