Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1987-08-19
1989-03-28
Pianalto, Bernard
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
B05D 306
Patent
active
048162914
ABSTRACT:
A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber.
REFERENCES:
patent: 3791852 (1974-02-01), Bunshah
patent: 3916052 (1975-10-01), Shattes et al.
patent: 4297387 (1981-10-01), Beale
patent: 4336277 (1982-06-01), Bunshah et al.
patent: 4412899 (1983-11-01), Beale
patent: 4415420 (1983-11-01), Beale
patent: 4416912 (1983-11-01), Bache
patent: 4436830 (1984-03-01), Andreev et al.
patent: 4452686 (1984-06-01), Axenov et al.
patent: 4486286 (1984-12-01), Lewin et al.
patent: 4495044 (1985-01-01), Banks
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4554201 (1985-11-01), Andreev et al.
patent: 4643952 (1987-02-01), Kurakata
patent: 4655893 (1987-04-01), Beale
patent: 4656052 (1987-04-01), Satou et al.
Bunshah Rointan F.
Desphandey Chandra V.
Doerr Hans J.
Pianalto Bernard
The Regents of the University of California
LandOfFree
Process for making diamond, doped diamond, diamond-cubic boron n does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for making diamond, doped diamond, diamond-cubic boron n, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for making diamond, doped diamond, diamond-cubic boron n will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1658236