Process for making dense mixed metal Si 3 N 4 targets

Details Process for making dense mixed metal Si 3 N 4 targets Process for making dense mixed metal Si 3 N 4 targets

2003-08-27

2009-12-29

King, Roy (Department: 1793)

Stock material or miscellaneous articles

Composite

Of silicon containing

C501S097200, C501S097300, C264S683000

Reexamination Certificate

active

07638200

ABSTRACT:
A composition and method for fabricating high-density Ta—Al—O, Ta—Si—N, and W—Si—N sputtering targets, having particular usefulness for the sputtering of heater layers for ink jet printers. Compositions in accordance with the invention comprise a metal component, Si3N4, and a sintering aid so that the targets will successfully sputter without cracking, etc. The components are combined in powder form and pressure consolidated under heated conditions for a time sufficient to form a consolidated blend having an actual density of greater that about 95% of the theoretical density. The consolidated blend may then be machined so as to provide the final desired target shape.

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Machine translation of JP-11139877A (Yamakawa et al).

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