Process for making a thin film magnetic head with single step li

Details Process for making a thin film magnetic head with single step li Process for making a thin film magnetic head with single step li

1991-08-05

1992-02-11

Tufariello, T. M.

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Coating selected area

2041922, 20419222, C25D 502

Patent

active

050873326

ABSTRACT:
A process for making thin film magnetic heads includes forming a precisely defined back gap opening used for magnetic closure of the P1 and P1 pole pieces. A mushroom-like photoresist structure having a cap layer supported by a stem layer is formed over the P1 pole piece by a double resist spin and double exposure method with a critical baking step to harden previously deposited photoresist layers between the first exposure and the second photoresist spin. The cap layer defines the back gap opening. When the mushroom-like photoresist structure is removed by a single step lift-off with a solvent, the back gap opening is formed.

REFERENCES:
patent: 4481071 (1984-11-01), Anderson

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