Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2011-08-16
2011-08-16
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S025350, C029S025410, C029S602100, C216S040000
Reexamination Certificate
active
07996984
ABSTRACT:
A duplexer includes an FBAR band pass filter that can be easily embodied in single chip. A method for manufacturing the same includes the steps of forming a plurality of recesses in a substrate, forming an insulation layer on the substrate, and forming a plurality of filling-up layers that fill the recesses. The method also includes the step of forming a transmitting bandpass filter and forming a receiving bandpass filter on an upper side of the membrane, with each bandpass filter including at least two film bulk acoustic resonators (FBARs). In addition, the method includes the step of forming a circuit that connects the bandpass filters to an antenna terminal, with this circuit including at least one inductor and capacitor. The method also includes a step of removing the filling-up layers from the recesses in the substrate.
REFERENCES:
patent: 5789845 (1998-08-01), Wadaka et al.
patent: 6262637 (2001-07-01), Bradley et al.
patent: 6297580 (2001-10-01), Takayama et al.
patent: 6313715 (2001-11-01), Bergmann et al.
patent: 6377137 (2002-04-01), Ruby
patent: 6407649 (2002-06-01), Tikka et al.
patent: 6486751 (2002-11-01), Barber et al.
patent: 6509813 (2003-01-01), Ella et al.
patent: 06224678 (1994-08-01), None
patent: 20020037070 (2002-05-01), None
MEMS Solution Inc.
Rabin & Berdo P.C.
Tugbang A. Dexter
LandOfFree
Process for making a FBAR bandpass filter does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for making a FBAR bandpass filter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for making a FBAR bandpass filter will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2775479