Process for lowering residual tantalum values in niobium

Details Process for lowering residual tantalum values in niobium Process for lowering residual tantalum values in niobium

1989-07-11

1990-08-14

Stoll, Robert L.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group vb metal

423 67, 423 68, 423592, C01G 3300

Patent

active

049485709

ABSTRACT:
The process for removing tantalum values from niobium values wherein a NbCl.sub.5 /TaCl.sub.5 charge mixture having a molar ratio from about 10/1 to about 10,000/1 is mixed with a 8N to 20N aqueous HCl solution at a total charge concentration of from about 50 to about 150 parts/100 parts by weight of the HCl solution to form a hydrolysis system, and wherein at least the surface of the hydrolysis system is contacted with air or a gas-containing air for a period of time within which a precipitate settles out at an average rate of from about 0.1 to about 6.0% by weight of the initial solids charge per hour.

REFERENCES:
patent: 4490340 (1984-12-01), Ritsko et al.
patent: 4537750 (1985-08-01), Ritsko et al.
Miller, G. L., "The Separation of Tartalum and Niobium" The Industrial Chemist 35, Apr., 1959, pp. 175-182.

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