Process for low temperature curing of sol-gel thin films

Details Process for low temperature curing of sol-gel thin films Process for low temperature curing of sol-gel thin films

1985-11-06

1987-11-03

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

4273977, 501 12, B05D 306

Patent

active

047042990

ABSTRACT:
A process for curing and densifying a sol-gel derived inorganic thin film at lower temperatures (between 10.degree. C. and 400.degree. C.) by applying the films to a substrate, drying the film at a low temperature, exposing the film to a low pressure plasma. The film may be an oxide (e.g. SiO.sub.2), nitride (e.g. Si.sub.3 N.sub.4), oxynitride (e.g. SiO.sub.x N.sub.y) or sulfide (e.g. GeS.sub.2).

REFERENCES:
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patent: 3770499 (1973-10-01), Crowe et al.
patent: 4168330 (1979-09-01), Kaganowkz
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patent: 4297246 (1981-10-01), Cairns et al.
patent: 4361598 (1982-11-01), Yoldas
patent: 4420517 (1983-12-01), Ali
patent: 4435476 (1984-03-01), Phillips et al.
patent: 4472512 (1984-09-01), Lane et al.
patent: 4521441 (1985-06-01), Flowers

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