Process for investigating particles situated in a gas

Details Process for investigating particles situated in a gas Process for investigating particles situated in a gas

1994-02-25

1995-07-11

Chiesa, Richard L.

Gas separation: processes

Electric or electrostatic field

55270, 73 2802, 95 70, 96 16, 96 55, 250382, 250423P, 422 24, B03C 3016

Patent

active

054317142

ABSTRACT:
In the process for investigating particles situated in a gas, a gas stream is guided past a miniaturized UV excimer radiator. In this case, the particles are ionized and subsequently filtered out, and the resultant photoelectrically induced current is measured. Since particles from different sources (petrol engine, diesel engine, cigarette smoke) exhibit a wavelength dependence which is characteristic of the source, by measurements at at least two wavelengths, which is readily possible when using UV excimer radiators with different gas fillings, pollutants can be detected according to the source.

REFERENCES:
patent: 3313971 (1967-04-01), Nagy
patent: 4377749 (1983-03-01), Young
patent: 4750917 (1988-06-01), Fujii
patent: 4837440 (1989-06-01), Burtscher et al.
patent: 5185015 (1993-02-01), Searle
patent: 5220284 (1993-06-01), Ruegg et al.
patent: 5288305 (1994-02-01), Gellert et al.
Eliasson et al., "Neue UV-Strahler fur industrielle Anwendungen", Publication CH-E 3.30833.0 D, (Reprint From ABB Technik), Mar., 1991, pp. 3-10.
Zeitschrift fur Phsikalische Chemie Neue Folge, Bd. 159, Von W. Robers, et al., "Photo-und Thremoionisation von Aerosolen durch gepulstes Laserlicht", pp. 129-148, Jan. 24, 1989.

Affiliated with

Also associated with

Rating

Process for investigating particles situated in a gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for investigating particles situated in a gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for investigating particles situated in a gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-500518