Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1990-12-14
1992-03-31
Breneman, R. Bruce
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
502 85, 502 86, C01B 3334
Patent
active
051006448
ABSTRACT:
The removal of aluminum and silicon atoms from the framework of crystalline zeolites and the reinsertion of at least some of the removed silicon atoms into the sites vacated by extracted aluminum atoms is accomplished by the process of contacting the zeolite with an aqueous solution of a bifluoride salt, preferably ammonium bifluoride. The treated zeolites have higher crystal destruction temperatures than their precursor starting zeolites.
REFERENCES:
patent: 2331473 (1943-10-01), Hyman
patent: 3493519 (1970-02-01), Kerr et al.
patent: 3594331 (1971-07-01), Elliott, Jr.
patent: 3933983 (1976-01-01), Elliott, Jr.
patent: 4596704 (1986-06-01), Miale et al.
patent: 4943545 (1990-07-01), Chang et al.
Chapman-Snyder Diane M.
Flanigen Edith M.
Skeels Gary W.
Breneman R. Bruce
McBride Thomas K.
Miller Richard G.
UOP
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