Process for increasing the annealing point of 96% silica glass

Glass manufacturing – Processes – With destruction or delamination of transitory attached or...

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65 30R, 65 32, 65117, 65120, C03C 1900, C03C 1500, C03B 2500

Patent

active

041166574

ABSTRACT:
A process for producing transparent high-annealing-point 96% silica glass comprising the steps of depositing a carbon film on the pore walls of the glass, heating the glass and film under non-oxidizing conditions, and removing the carbon film by oxidation, is described.

REFERENCES:
patent: 772902 (1904-10-01), Nolan
patent: 2505001 (1950-04-01), Nordberg
patent: 2612726 (1952-10-01), Nordberg
patent: 2612727 (1952-10-01), Nordberg
patent: 3775078 (1973-11-01), Elmer et al.
patent: 3813232 (1974-05-01), Forker, Jr. et al.
patent: 3930821 (1976-01-01), Elmer

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