Process for improving nitride deposition on a semiconductor wafe

Details Process for improving nitride deposition on a semiconductor wafe Process for improving nitride deposition on a semiconductor wafe

1982-05-17

1983-09-06

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118715, 134 37, 427 95, H01L 21318

Patent

active

044029977

ABSTRACT:
In a process for depositing nitride on semiconductor wafers in a tube, streaks can develop on the wafers. The streaks are eliminted by flowing oxygen through the tube between nitride depositions of different groups of wafers.

REFERENCES:
patent: 3924024 (1975-12-01), Naber
patent: 3983198 (1976-09-01), Mangels
patent: 4098923 (1978-07-01), Alberti
patent: 4279947 (1981-07-01), Goldman
patent: 4376796 (1983-03-01), Arrasmith

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